Authors

Wolke, K.; Riedel, T.; Haug, Rainer; De Gendt, Stefan; Heyns, Marc; Meuris, Marc

Conference

Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium

Title

Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor

Publication type

Proceedings paper

Embargo date

9999-12-31