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A HF vapour etch process for integration in cluster-tool processes: characteristics and applications

dc.contributor.authorVermeulen, W.J.C.
dc.contributor.authorkwakman, L.F.T.
dc.contributor.authorWerkhoven, C.J.
dc.contributor.authorGranneman, E.H.A.
dc.contributor.authorVerhaverbeke, Steven
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T12:55:26Z
dc.date.available2021-09-29T12:55:26Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/494
dc.sourceIIOimport
dc.titleA HF vapour etch process for integration in cluster-tool processes: characteristics and applications
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage241
dc.source.endpage252
dc.source.conferenceProceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate15/10/1993
dc.source.conferencelocationNew Orleans, LA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 94-7


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