A HF vapour etch process for integration in cluster-tool processes: characteristics and applications
dc.contributor.author | Vermeulen, W.J.C. | |
dc.contributor.author | kwakman, L.F.T. | |
dc.contributor.author | Werkhoven, C.J. | |
dc.contributor.author | Granneman, E.H.A. | |
dc.contributor.author | Verhaverbeke, Steven | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-09-29T12:55:26Z | |
dc.date.available | 2021-09-29T12:55:26Z | |
dc.date.issued | 1994 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/494 | |
dc.source | IIOimport | |
dc.title | A HF vapour etch process for integration in cluster-tool processes: characteristics and applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 241 | |
dc.source.endpage | 252 | |
dc.source.conference | Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing | |
dc.source.conferencedate | 15/10/1993 | |
dc.source.conferencelocation | New Orleans, LA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Electrochemical Society Proceedings; Vol. 94-7 |