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A semi-quantitative method for studying photoresist stripping

dc.contributor.authorRotondaro, Antonio
dc.contributor.authorMeuris, Marc
dc.contributor.authorSchmidt, Harald
dc.contributor.authorHeyns, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClaeys, Cor
dc.contributor.authorHellemans, L.
dc.contributor.authorSnauwert, L.
dc.date.accessioned2021-09-29T12:55:30Z
dc.date.available2021-09-29T12:55:30Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/495
dc.sourceIIOimport
dc.titleA semi-quantitative method for studying photoresist stripping
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage581
dc.source.endpage586
dc.source.conferenceProceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate15/10/1993
dc.source.conferencelocationNew Orleans, LA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 94-7


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