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Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2

dc.contributor.authorSchwalm, R.
dc.contributor.authorBinder, H.
dc.contributor.authorFischer, T.
dc.contributor.authorFunhoff, D.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGrassmann, A.
dc.contributor.authorMoritz, H.
dc.contributor.authorPaniez, P.
dc.contributor.authorReuhman-Huisken, M.
dc.contributor.authorVinet, F.
dc.contributor.authorDijkstra, H.
dc.contributor.authorKrause, A.
dc.date.accessioned2021-09-29T12:55:34Z
dc.date.available2021-09-29T12:55:34Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/496
dc.sourceIIOimport
dc.titleRobust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2
dc.source.endpage13
dc.source.conferenceAdvances in Resist Technology and Processing XI
dc.source.conferencedate27/02/1994
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2195


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