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High temperature grazing incidence XRD study on in-situ crystallization in ultra-thin oxide films

dc.contributor.authorZhao, Chao
dc.contributor.authorRoebben, G.
dc.contributor.authorYoung, Edward
dc.contributor.authorBender, Hugo
dc.contributor.authorHoussa, Michel
dc.contributor.authorNaili, Mohamed
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-14T14:24:39Z
dc.date.available2021-10-14T14:24:39Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4972
dc.sourceIIOimport
dc.titleHigh temperature grazing incidence XRD study on in-situ crystallization in ultra-thin oxide films
dc.typeOral presentation
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference11th Workshop on Dielectrics in Microelectronics; 13-15 November 2000; Munich, Germany.
dc.source.conferencelocation
imec.availabilityPublished - imec


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