Browsing Articles by imec author "1a00bb760e20c5ca0608491087a61c9d19f6d8e8"
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157nm resist process performance and integration challenges on a full field scanner
Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010) -
CMOS integration of high-k/metal gate transistors in diffusion and gate replacement (D&GR) scheme for dynamic random access memory peripheral circuits
Dentoni Litta, Eugenio; Ritzenthaler, Romain; Schram, Tom; Spessot, Alessio; O'Sullivan, Barry; Machkaoutsan, Vladimir; Fazan, Pierre; Ji, Yunhyuck; Mannaert, Geert; Lorant, Christophe; Sebaai, Farid; Thiam, Arame; Ercken, Monique; Demuynck, Steven; Horiguchi, Naoto (2018) -
Determining the impact of statistical fluctuations on resist edge roughness
Leunissen, Peter; Ercken, Monique; Patsis, G.P. (2005) -
Fabrication of magnetic tunnel junctions connected through a continuous free layer to enable spin logic devices
Wan, Danny; Manfrini, Mauricio; Vaysset, Adrien; Souriau, Laurent; Wouters, Lennaert; Thiam, Arame; Raymenants, Eline; Sayan, Safak; Jussot, Julien; Swerts, Johan; Couet, Sebastien; Rassoul, Nouredine; Babaei Gavan, Khashayar; Paredis, Kristof; Huyghebaert, Cedric; Ercken, Monique; Wilson, Chris; Mocuta, Dan; Radu, Iuliana (2018) -
Fine lines between success and failure
Kinkead, D. A.; Ercken, Monique (2000) -
Immersion photoresist qualification
Ercken, Monique; Gronheid, Roel; Pollentier, Ivan; Leray, Philippe (2007-05) -
Line edge roughness: experimental results related to a two-parameter model
Leunissen, Peter; Lawrence, W.G.; Ercken, Monique (2004) -
Litho enhancements for 45nm-node MuGFETs
Verhaegen, Staf; Ercken, Monique; Nackaerts, Axel; Vandenberghe, Geert (2005) -
Metrology method for the correlation of line edge roughness for different resists before and after etch
Winkelmeier, Stephanie; Sarstedt, Margit; Ercken, Monique; Goethals, Mieke; Ronse, Kurt (2001) -
New lithographic requirements for the implant levels in scaled devices
Vandeweyer, Tom; Baerts, Christina; Horiguchi, Naoto; Ercken, Monique (2011) -
Opportunities and challenges in immersion lithography
Maenhoudt, Mireille; Vandenberghe, Geert; Ercken, Monique; Cheng, Shaunee; Leunissen, Peter; Ronse, Kurt (2005) -
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Ercken, Monique; Moelants, Myriam; Pollers, Ingrid; Van Puyenbroeck, Ilse; Goethals, Mieke; Ronse, Kurt; Pawlowski, G.; Spiess, Walter (1999) -
Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
Ercken, Monique; Moelants, Myriam; Vandenberghe, Geert; Goethals, Mieke; Ronse, Kurt; Masuda, Seiya; Spiess, Walter; Pawlowski, G. (2000) -
Precuring implant photoresists for shrink and patterning control
Winroth, Gustaf; Rosseel, Erik; Delvaux, Christie; Altamirano Sanchez, Efrain; Ercken, Monique (2013) -
Recent progress in ArF lithography for the 100nm node
Goethals, Mieke; Vandenberghe, Geert; Pollentier, Ivan; Ercken, Monique; Bisschop, P.; Maenhoudt, Mireille; Ronse, Kurt (2001) -
The impact of airborne molecular bases on DUV photoresists
Ruede, D.; Ercken, Monique; Borgers, Tom (2001)