Browsing Articles by imec author "452a1d3245e0c6bc2051cf393b75ddc7629aea2c"
Now showing items 21-40 of 65
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EUV mask defectivity – A process of increasing control towards HVM
Jonckheere, Rik (2017) -
EUVL at IMEC: shadowing compensation and Flare mitigation
Lorusso, Gian; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Ronse, Kurt; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Ritter, D. (2007-11) -
Experimental and simulation comparison of electron beam proximity correction
Leunissen, Peter; Jonckheere, Rik; Hofmann, Uli; Ünal, Nezih; Kalus, Christian (2004) -
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections
Myers, Alan; Lorusso, Gian; Kim, In Sung; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Exploring capabilities of electrical linewidth measurement (ELM) techniques
Rangelov, Ventzeslav; Sarstedt, Margit; Somerville, John; Marschner, Thomas; Jonckheere, Rik; Poelaert, Abel (2001) -
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Fabrication of 100 nm pitch copper interconnects by electron beam lithography
Wu, Wen; Jonckheere, Rik; Tokei, Zsolt; Brongersma, Sywert; Van Hove, Marleen; Maex, Karen (2004) -
Feature proximity errors on mask: assessment results of commercially obtained reticles
Jonckheere, Rik; Philipsen, Vicky (2003) -
FIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV
Prewett, P. D.; Martin, B.; Watson, J. G.; Eastwood, A. W.; Jonckheere, Rik (1994) -
Flare mitigation strategies in extreme ultraviolet lithography
Kim, Insung; Myers, Alan; Melvin, Lawrence; Ward, Brian; Lorusso, Gian; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
Flux confinement by artificial arrays and clusters in superconducting films
Bruynseraede, Y.; Puig, T.; Rosseel, Erik; Baert, M.; Van Bael, Marleen; Temst, K.; Moshchalkov, V. V.; Jonckheere, Rik (1997) -
Flux confinement by regular arrays and clusters of antidots in Pb/Cu bilayers
Rosseel, Erik; Puig, T.; Van Bael, M.J.; Baert, M.; Moshchalkov, V. V.; Bruynseraede, Y.; Jonckheere, Rik (1998) -
Flux phases and quantized pinning force in superconductors with a periodic lattice of pinning centres
Baert, M.; Metlushko, V. V.; Jonckheere, Rik; Moshchalkov, V. V.; Bruynseraede, Y. (1995) -
Flux pinning properties of holes and blind holes arranged periodically in a superconductor
Raedts, S.; Silhanek, A.V.; Van Bael, M.J.; Jonckheere, Rik; Moshchalkov, V.V. (2004) -
Giant vortex state in perforated aluminum microsquares
Bruyndoncx, V.; Rodrigo, J. G.; Puig, T.; Van Look, L.; Moshchalkov, V. V.; Jonckheere, Rik (1999) -
Guided vortex motion in superconductors with a square antidot array
Silhanek, A.V.; Van Look, Lieve; Raedts, S.; Jonckheere, Rik; Moshchalkov, V.V. (2003-12) -
In-plane anisotropic vortex motion induced by a square array of antidots
Silhanek, A.V.; Van Look, Lieve; Raedts, S.; Jonckheere, Rik; Moshchalkov, V.V. (2004) -
In-plane vector magnetometry on rectangular Co dots using polarized neutron reflectivity
Temst, K.; Van Bael, M.J.; Swerts, J.; Buntinx, D.; Van Haesendonck, Chris; Bruynseraede, Y.; Fritzsche, H.; Jonckheere, Rik (2003) -
Influence of gate patterning on line edge roughness
Leunissen, Peter; Jonckheere, Rik; Ronse, Kurt; Derksen, G.B. (2003) -
Lithography options for the 32nm half pitch node and beyond
Ronse, Kurt; Jansen, Philippe; Gronheid, Roel; Hendrickx, Eric; Maenhoudt, Mireille; Wiaux, Vincent; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert (2009)