Browsing Articles by imec author "ca30497f34ffb9dbb8aeb60a71a99f1dba689ded"
Now showing items 1-6 of 6
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Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, JiHoon; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryota; Chikashi, Ito; Polli, Marco; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Effect of PAG distribution on ArF and EUV resist performance
Gronheid, Roel; Rathsack, Benjamin; Bernard, Sophie; Vaglio Pret, Alessandro; Nafus, Kathleen; Hatakeyama, Shinichi (2009) -
Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D. (2011) -
Frequency mulitiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern
Gronheid, Roel; Rincon Delgadillo, Paulina; Younkin, Todd; Pollentier, Ivan; Somervell, Mark; Hooge, Joshua S.; Nafus, Kathleen; Nealey, Paul F. (2012) -
Partial wetting of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish
Vereecke, Guy; Xu, XiuMei; Tsai, W.K.; Yang, Hui; Armini, Silvia; Delande, Tinne; Doumen, Geert; Kentie, F.; Shi, Xiaoping; Simms, Ihsan; Nafus, Kathleen; Holsteyns, Frank; Struyf, Herbert; De Gendt, Stefan (2014) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011)