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A controlled deposition of organic contamination and the removal with ozone based cleaning

dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenens, Conny
dc.contributor.authorConard, Thierry
dc.contributor.authorBender, Hugo
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBauer, T.
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T16:41:47Z
dc.date.available2021-10-14T16:41:47Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5142
dc.sourceIIOimport
dc.titleA controlled deposition of organic contamination and the removal with ozone based cleaning
dc.typeProceedings paper
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage223
dc.source.endpage226
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena. Part B; Vol. 76-77


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