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TOFSIMS as a monitor for thin film growth

dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPétry, Jasmine
dc.contributor.authorZhao, Chao
dc.contributor.authorBesling, Wim
dc.contributor.authorNohira, Hiroshi
dc.contributor.authorRichard, Olivier
dc.date.accessioned2021-10-14T16:43:21Z
dc.date.available2021-10-14T16:43:21Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5163
dc.sourceIIOimport
dc.titleTOFSIMS as a monitor for thin film growth
dc.typeOral presentation
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.conference13th International Conference on Secondary Ion Mass Spectrometry - SIMS 13; 11-16 November 2001; Nara, Japan.
dc.source.conferencelocation
imec.availabilityPublished - imec


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