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Articles
Impact of gate oxide nitridation process on 1/f noise in 0.18 micron CMOS
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Impact of gate oxide nitridation process on 1/f noise in 0.18 micron CMOS
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Date
2001
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Da Rold, Martina
;
Simoen, Eddy
;
Mertens, S.
;
Schaekers, Marc
;
Badenes, Gonçal
;
Decoutere, Stefaan
Journal
Microelectronics Reliability
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1935
since deposited on 2021-10-14
1
last month
Acq. date: 2026-02-26
Citations
Statistics
Views
1935
since deposited on 2021-10-14
1
last month
Acq. date: 2026-02-26
Citations