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Gate stack preparation with high-k materials in a cluster tool

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorConard, Thierry
dc.contributor.authorNohira, Hiroshi
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorMaes, Jos
dc.contributor.authorTuominen, Marko
dc.contributor.authorBajolet, Philippe
dc.date.accessioned2021-10-14T16:45:36Z
dc.date.available2021-10-14T16:45:36Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5190
dc.sourceIIOimport
dc.titleGate stack preparation with high-k materials in a cluster tool
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage395
dc.source.endpage398
dc.source.conferenceProceedings of the IEEE International Symposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate8/10/2001
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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