Silicide engineering: influence of alloying elements on CoSi2 nucleation
dc.contributor.author | Detavernier, C. | |
dc.contributor.author | Van Meirhaeghe, R. L. | |
dc.contributor.author | Maex, Karen | |
dc.contributor.author | Cardon, F. | |
dc.date.accessioned | 2021-10-14T16:51:17Z | |
dc.date.available | 2021-10-14T16:51:17Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5251 | |
dc.source | IIOimport | |
dc.title | Silicide engineering: influence of alloying elements on CoSi2 nucleation | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Maex, Karen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | C8.4 | |
dc.source.conference | Gate stack and silicide issues in silicon processing; MRS Spring Meeting 2000 Symposium | |
dc.source.conferencedate | 25/04/2000 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 611 |