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Characterization and integration of a new Si-O-C film deposited by CVD

dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorStruyf, Herbert
dc.contributor.authorLepage, Muriel
dc.contributor.authorCoenegrachts, Bart
dc.contributor.authorStucchi, Michele
dc.contributor.authorDe Roest, David
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.contributor.authorGaillard, F.
dc.contributor.authorXia, L. Q.
dc.contributor.authorLim, T. H.
dc.contributor.authorGotuaco, M.
dc.contributor.authorYieh, E.
dc.contributor.authorVan Autryve, Luc
dc.date.accessioned2021-10-14T16:52:40Z
dc.date.available2021-10-14T16:52:40Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5263
dc.sourceIIOimport
dc.titleCharacterization and integration of a new Si-O-C film deposited by CVD
dc.typeProceedings paper
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage595
dc.source.endpage601
dc.source.conferenceAdvanced Metallization Conference 2000
dc.source.conferencedate3/10/2000
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec
imec.internalnotesConference Proceedings ULSI XVI


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