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HF etching of Si-oxides and Si-nitrides for surface micromachining

dc.contributor.authorDu Bois, Bert
dc.contributor.authorVereecke, Guy
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDe Moor, Piet
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorDe Caussemaeker, Ann
dc.contributor.authorVerbist, Agnes
dc.date.accessioned2021-10-14T16:53:45Z
dc.date.available2021-10-14T16:53:45Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5273
dc.sourceIIOimport
dc.titleHF etching of Si-oxides and Si-nitrides for surface micromachining
dc.typeProceedings paper
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.beginpage131
dc.source.endpage136
dc.source.conferenceProceedings of the Sensor Technology Conference 2001
dc.source.conferencedate14/05/2001
dc.source.conferencelocationEnschede The Netherlands
imec.availabilityPublished - imec


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