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Bias-induced junction displacements in SSRM and SCM

dc.contributor.authorEyben, Pierre
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T16:55:06Z
dc.date.available2021-10-14T16:55:06Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5285
dc.sourceIIOimport
dc.titleBias-induced junction displacements in SSRM and SCM
dc.typeMeeting abstract
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage159
dc.source.conference6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ
dc.source.conferencedate22/04/2001
dc.source.conferencelocationNapa, CA USA
imec.availabilityPublished - open access


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