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Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
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Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
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Date
2001
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5445.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lauerhaas, Jeff
;
Mertens, Paul
;
Nicolosi, T.
;
Kenis, Karine
;
Fyen, Wim
;
Heyns, Marc
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Acq. date: 2026-01-10
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Views
2062
since deposited on 2021-10-14
3
last month
3
last week
Acq. date: 2026-01-10
Citations