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Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
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Authors
Lauerhaas, Jeff
;
Xu, Kaidong
;
Vereecke, Guy
;
Vos, Rita
;
Kenis, Karine
;
Mertens, Paul
;
Wu, Y.
;
Nicolosi, T.
;
Heyns, Marc
Conference
200th International Meeting Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device
Title
Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
Publication type
Meeting abstract
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