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Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz

dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorXu, Kaidong
dc.contributor.authorVereecke, Guy
dc.contributor.authorVos, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorWu, Y.
dc.contributor.authorNicolosi, T.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T17:13:52Z
dc.date.available2021-10-14T17:13:52Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5432
dc.sourceIIOimport
dc.titleSub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
dc.typeMeeting abstract
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conference200th International Meeting Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device
dc.source.conferencedate2/09/2001
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 1422


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