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Model based OPC for 1st generation 193-nm lithography

dc.contributor.authorLucas, Kevin
dc.contributor.authorWord, James
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-14T17:17:40Z
dc.date.available2021-10-14T17:17:40Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5458
dc.sourceIIOimport
dc.titleModel based OPC for 1st generation 193-nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage119
dc.source.endpage130
dc.source.conferenceOptical Microlithography XIV
dc.source.conferencedate27/02/2001
dc.source.conferencelocationSanta Clara,CA USA
imec.availabilityPublished - imec


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