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Formation of epitaxial CoSi2 film on Si1-xGex(100) by reactive deposition epitaxy of Co1-xTix layer

dc.contributor.authorPeto, G.
dc.contributor.authorMolnar, G.
dc.contributor.authorKotai, E.
dc.contributor.authorDezsi, I.
dc.contributor.authorKarlsteen, M.
dc.contributor.authorSödervall, U.
dc.contributor.authorWillander, M.
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.date.accessioned2021-10-14T17:34:42Z
dc.date.available2021-10-14T17:34:42Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5568
dc.sourceIIOimport
dc.titleFormation of epitaxial CoSi2 film on Si1-xGex(100) by reactive deposition epitaxy of Co1-xTix layer
dc.typeOral presentation
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceSymposium D of the E-MRS Spring Meeting 2001: 2nd International Conference on Silicon Epitaxy and Heterostructures; June 5-8, 20
dc.source.conferencelocation
imec.availabilityPublished - imec
imec.internalnotes


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