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Front-end-of-line process development using 193-nm lithography

dc.contributor.authorPollentier, Ivan
dc.contributor.authorErcken, Monique
dc.contributor.authorEliat, Astrid
dc.contributor.authorDelvaux, Christie
dc.contributor.authorJaenen, Patrick
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T17:36:52Z
dc.date.available2021-10-14T17:36:52Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5581
dc.sourceIIOimport
dc.titleFront-end-of-line process development using 193-nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage56
dc.source.endpage68
dc.source.conferenceLithography for Semiconductor Manufacturing II
dc.source.conferencedate30/05/2001
dc.source.conferencelocationEdinburgh UK
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4404


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