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Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Publication:
Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Date
2001
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tsai, Wilman
;
Nohira, Hiroshi
;
Carter, Richard
;
Caymax, Matty
;
Conard, Thierry
;
De Gendt, Stefan
;
Heyns, Marc
;
Pétry, Jasmine
;
Richard, Olivier
;
Vandervorst, Wilfried
;
Young, Edward
;
Zhao, Chao
;
Maes, Jos
;
Tuominen, Marko
Journal
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2008
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2008
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations