Low-temperature 193nm resist reflow process for 100 nm generation contact patterning

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Authors
Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen
Conference
Lithography for Semiconductor Manufacturing II
Title
Low-temperature 193nm resist reflow process for 100 nm generation contact patterning
Publication type
Proceedings paper
Embargo date
9999-12-31
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