(Sub-) 100-nm gate patterning using 248-nm alternating PSM

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Authors
Vandenberghe, Geert; Jaenen, Patrick; Jonckheere, Rik; Ronse, Kurt; Toublan, O.
Conference
Photomask and Next-Generation Lithography Mask Technology VIII
Title
(Sub-) 100-nm gate patterning using 248-nm alternating PSM
Publication type
Proceedings paper
Embargo date
9999-12-31
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