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Removal of photoresist by O3DI water processes: determination of degradation products

dc.contributor.authorVankerckhoven, Hans
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorVinckier, Chris
dc.contributor.authorVan Herp, Bart
dc.contributor.authorClaes, M.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T18:16:20Z
dc.date.available2021-10-14T18:16:20Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5798
dc.sourceIIOimport
dc.titleRemoval of photoresist by O3DI water processes: determination of degradation products
dc.typeMeeting abstract
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac
dc.source.conferencedate2/09/2001
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 1411


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