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The origins of fluorine in dry ultrathin silicon oxides

dc.contributor.authorVereecke, Guy
dc.contributor.authorRöhr, Erika
dc.contributor.authorCarter, Richard
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T18:18:16Z
dc.date.available2021-10-14T18:18:16Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5807
dc.sourceIIOimport
dc.titleThe origins of fluorine in dry ultrathin silicon oxides
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage153
dc.source.endpage156
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena. Part B; Vol. 76-77


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