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Single chemistry cleaning solution for advanced wafer cleaning

dc.contributor.authorVos, Rita
dc.contributor.authorDoll, O.
dc.contributor.authorFester, A.
dc.contributor.authorKolbesen, B. O.
dc.contributor.authorLux, Marcel
dc.contributor.authorKenis, Karine
dc.contributor.authorOnsia, Bart
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorSchellkes, E.
dc.contributor.authorHatcher, Z.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T18:21:01Z
dc.date.available2021-10-14T18:21:01Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5821
dc.sourceIIOimport
dc.titleSingle chemistry cleaning solution for advanced wafer cleaning
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage119
dc.source.endpage122
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena. Part B; Vol. 76-77


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