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Comparison of Bosch and cryogenic processes for patterning high aspect ration features in silicon

dc.contributor.authorWalker, M. J.
dc.contributor.authorde Boer, M. J.
dc.contributor.authorJansen, Henri
dc.date.accessioned2021-10-14T18:22:50Z
dc.date.available2021-10-14T18:22:50Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5829
dc.sourceIIOimport
dc.titleComparison of Bosch and cryogenic processes for patterning high aspect ration features in silicon
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.conferenceMEMS Design, Fabrication, Characterization and Packaging; 1 June 2001; Edinburgh, Scotland.
dc.source.conferencelocation
imec.availabilityPublished - imec


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