Optimization of cleaning processes for 100 nm and smaller design rules

No Thumbnail [100%x80]
Metadata
Show full item record
Authors
Xu, Kaidong; Vos, Rita; Holsteyns, Frank; Kenis, Karine; Vereecke, Guy; Mertens, Paul; Heyns, Marc
Conference
SemaTech Yield Management Seminar; August 2001; Singapore and Taiwan.
Title
Optimization of cleaning processes for 100 nm and smaller design rules
Publication type
Oral presentation
Collections