dc.contributor.author | Xu, Kaidong | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-14T18:26:56Z | |
dc.date.available | 2021-10-14T18:26:56Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5849 | |
dc.source | IIOimport | |
dc.title | Optimization of cleaning processes for 100 nm and smaller design rules | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.source.peerreview | no | |
dc.source.conference | SemaTech Yield Management Seminar; August 2001; Singapore and Taiwan. | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |