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2D inner assist features for 0.55NA: mask wafer data characterization
Publication:
2D inner assist features for 0.55NA: mask wafer data characterization
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3071997
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Leitao, Sofia
;
Dhagat, Paml
;
Chen, Jeremy
;
Pandey, Nitesh
;
Hennerkes, Christoph
Journal
PHOTOMASK TECHNOLOGY 2025
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4
since deposited on 2026-03-31
Acq. date: 2026-04-06
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Views
4
since deposited on 2026-03-31
Acq. date: 2026-04-06
Citations