High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

Wei, Chih-, I; Chen, Chao-Heng; Thakare, Devesh; Levinson, Zachary; Nge, Philip C. W.; Schatz, Jirka; Welling, Ulrich; Dawes, Andrew M. C.; Hopped, Wolfgang; Demmerle, Wolfgang; Liu, Ting-Chun; Preuninger, Juergen; Yu, Zhiru; Klosterman, Ulrich; Hwang, Soobin; Kareem, Pervaiz; Gillijns, Werner

doi:10.1117/12.3072706

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High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3072706

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PHOTOMASK TECHNOLOGY 2025

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6 since deposited on 2026-03-31

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Acq. date: 2026-08-07

High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

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