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Conference contributions
Enabling Curvilinear Masks: Novel Mask Qualification Methodology and Experimental Verification
Publication:
Enabling Curvilinear Masks: Novel Mask Qualification Methodology and Experimental Verification
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3072276
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Trivkovic, Darko
;
Jang, Il-Yong
;
Meusemann, Stefan
;
Wang, Xiaolong
;
Shi, Xuelong
;
Meng, Renyang
;
Chang, Chieh-Miao
;
Bender, Markus
;
Frangend, Andreas
;
Wang, Jane
;
Malacara, Victoria
;
Baskaran, Balakumar
;
Bekaert, Joost
Journal
PHOTOMASK TECHNOLOGY 2025
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since deposited on 2026-03-31
Acq. date: 2026-04-06
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Views
2
since deposited on 2026-03-31
Acq. date: 2026-04-06
Citations