Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
<i>In vacuo</i> XPS study: controlled ALD growth of Al<sub>2</sub>O<sub>3</sub> on metallic lithium enabled by plasma pretreatment
Publication:
<i>In vacuo</i> XPS study: controlled ALD growth of Al<sub>2</sub>O<sub>3</sub> on metallic lithium enabled by plasma pretreatment
Copy permalink
Date
2026
Journal article
https://doi.org/10.1039/d6ta00751a
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verhelle, Tippi
;
Henderick, Lowie
;
Yari, Saeed
;
Coessens, Siebe
;
Minjauw, Matthias M.
;
De Taeye, Louis
;
Vereecken, Philippe
;
Dendooven, Jolien
;
Safari, Momo
;
Detavernier, Christophe
Journal
JOURNAL OF MATERIALS CHEMISTRY A
Abstract
Plasma pretreatments create well-defined and reproducible lithium surfaces that govern TMA reactivity, leading to precursor decomposition or ALD-like Al 2 O 3 growth.
Description
Statistics
Views
5
since deposited on 2026-07-27
Acq. date: 2026-08-06
Citations
Statistics
Views
5
since deposited on 2026-07-27
Acq. date: 2026-08-06
Citations