Browsing Presentations by imec author "1d349074ca22eb09622abcf7d2652394a831bbfd"
Now showing items 1-10 of 10
-
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV mask defectivity study by existing DUV tools and new EBEAM technology
Mangan, Shmoolik; Jonckheere, Rik; Van Den Heuvel, Dieter; Rozentsvige, Moshe; Kudriashov, Vladislav; Shoval, Lior; Santoro, Gaetano; Englard, Ilan (2010) -
EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Bret, Tristan; Baralia, Gabriel; Baur, Christof; Budach, Michael; Hofmann, Thorsten; Edinger, Klaus; Magana, John; Jonckheere, Rik; Van Den Heuvel, Dieter (2011) -
EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Takagi, Noriaki; Watanabe, Hidehiro; Van Den Heuvel, Dieter; Jonckheere, Rik; Gallagher, Emily (2015) -
Improvements of multi-layer defect mapping with advanced inspection technology
Aharonson, Israel; Shoval, Lior; Wolf, Staud; Levesque, Shawn; Nitzan, Tobous; Englard, Ilan; Jonckheere, Rik; Van Den Heuvel, Dieter (2012) -
Integration issues in step and repeat UV nanoimprint lithography
Charpin-Nicolle, C.; Chiaroni, J.; Le Cunff, Y.; Denis, H.; Rochat, N.; Villani, M. L.; Massin, J.; Irmscher, M.; Vratzov, B.; van Hossen, H.; Gubbini, P.; Lorusso, Gian; Van Den Heuvel, Dieter (2008) -
Minimizing particle contamination of NXE3100 reticles
Jonckheere, Rik; Baudemprez, Bart; Waehler, Tobias; Van Den Heuvel, Dieter; Schmalfuss, Heiko; Brux, Oliver; Dress, Peter; Kappel, Christophe; Zickler, Leander (2012) -
Performance update of XT:1250Di
Maenhoudt, Mireille; Van Den Heuvel, Dieter; Cheng, Shaunee; Laidler, David; Hermans, Jan (2005) -
Status of 157nm Lithography Development
Jonckheere, Rik; Hermans, Jan; Goethals, Mieke; De Bisschop, Peter; Eliat, Astrid; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Johan M. D.; de Marneffe, Jean-Francois; Ronse, Kurt (2003) -
Study of multilayer defects on sub-32nm HP EUV reticles
Van Den Heuvel, Dieter; Jonckheere, Rik; Bret, Tristan; Waiblinger, Markus (2012)