Browsing Presentations by imec author "452a1d3245e0c6bc2051cf393b75ddc7629aea2c"
Now showing items 1-20 of 42
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An update on the SEMI standards mask qualification terminology task force
Jonckheere, Rik (2000) -
Avoiding yield loss for EUV Lithography due to mask
Jonckheere, Rik (2013) -
Characterization of periodic arrays of magnetic dots by x-ray reflectivity experiments
Van Bael, Marleen; Temst, K.; Moshchalkov, V. V.; Bruynseraede, Y.; Jonckheere, Rik (1999) -
Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
Watanabe, Genta; Jonckheere, Rik; Verduijn, Erik; Fukugami, Norihito; Sakata, Yo; Kodera, Yutaka; Gallagher, Emily (2015) -
EUV lithography development progress in IMEC
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2009) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010) -
EUV lithography: status and further challenges towards a maturing technology
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2010) -
EUV mask defect printability standardization
Jonckheere, Rik (2009) -
EUV mask defectivity study by existing DUV tools and new EBEAM technology
Mangan, Shmoolik; Jonckheere, Rik; Van Den Heuvel, Dieter; Rozentsvige, Moshe; Kudriashov, Vladislav; Shoval, Lior; Santoro, Gaetano; Englard, Ilan (2010) -
EUV mask pattern correction
Jonckheere, Rik; Hendrickx, Eric (2009) -
EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Bret, Tristan; Baralia, Gabriel; Baur, Christof; Budach, Michael; Hofmann, Thorsten; Edinger, Klaus; Magana, John; Jonckheere, Rik; Van Den Heuvel, Dieter (2011) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Takagi, Noriaki; Watanabe, Hidehiro; Van Den Heuvel, Dieter; Jonckheere, Rik; Gallagher, Emily (2015) -
Experiences with the "clean reticle handling" path towards HVM needs
Jonckheere, Rik (2013) -
Imec inputs on blank defectivity
Jonckheere, Rik (2011) -
IMEC lithography activities for 45nm node and beyond: mask impact
Philipsen, Vicky; De Bisschop, Peter; Hendrickx, Eric; Wiaux, Vincent; Vandenberghe, Geert; Jonckheere, Rik (2007) -
Impact and mitigation of EUV reticle contamination
Jonckheere, Rik (2010) -
Impact of mask stack on high NA EUV imaging
Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Vandenberghe, Geert; Davydova, Natalia; Fliervoet, Timon; Neumann, Jens Timo (2012)