Browsing Presentations by author "Hansen, Terje"
Now showing items 1-2 of 2
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Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013) -
Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013)