Publication:
Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
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1896 since deposited on 2021-10-21
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Acq. date: 2026-08-05
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Statistics
Views
1896 since deposited on 2021-10-21
2last month
2last week
Acq. date: 2026-08-05
Citations