Publication:
Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
Date
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.author | De Schepper, Peter | |
| dc.contributor.author | Hansen, Terje | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | De Schepper, Peter | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-21T06:42:21Z | |
| dc.date.available | 2021-10-21T06:42:21Z | |
| dc.date.issued | 2013 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21966 | |
| dc.source.conference | SPIE Advanced Lithography Conference | |
| dc.source.conferencedate | 24/02/2013 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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