Publication:
Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
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1893 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-11
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1893 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-11
Citations