Browsing Presentations by imec author "53bba3e3ec57505eff70d166367e000745367aa1"
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Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
ICP and ICPsm process development, a) dry strip only, b) low temperature SiC oxidation removal
Boullart, Werner; Mannaert, Geert; Baklanov, Mikhaïl; Shamiryam, D.; Vanhaelemeersch, Serge (1999) -
Low temperature oxidation and selective etching of CVD SiC films
Baklanov, Mikhaïl; Mannaert, Geert; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Post extension ion implant photo resist strip for 32 nm technology and beyond
Mannaert, Geert; Witters, Liesbeth; Shamiryan, Denis; Boullart, Werner; Han, Keping; Luo, Shiian; Falepin, Annelies; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo (2008) -
Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface
Boullart, Werner; Mannaert, Geert; Graham, S.; Tarassenko, C.; Mouche, Laurent (1998) -
Profile control for low-k patterning using TaN and TiN metallic hardmasks
Struyf, Herbert; Hendrickx, Dirk; Paraschiv, Vasile; Campos Garcia, Diana; Mannaert, Geert; Boullart, Werner; Vanhaelemeersch, Serge (2007) -
Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson Highlands chamber
Mannaert, Geert; Van Cauwenberghe, M.; Schmidt, Michael; Van Aelst, Joke; Hendrickx, Dirk; Stucchi, Michele; Conard, Thierry; Vanhaelemeersch, Serge; Boullart, Werner (2002)