Browsing Presentations by imec author "73d99862ebb6c4035b714a0f071f816b1b90b83a"
Now showing items 1-6 of 6
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Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
Process evaluation and optimization for EUV manufacturing
Foubert, Philippe; Nafus, Kathleen; Shite, Hideo; Goethals, Mieke; Matsunaga, Koichi; Hermans, Jan; Hendrickx, Eric (2012) -
Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012)