Browsing Presentations by imec author "a2d2100858e62bf4d4eccb36be1e670060372871"
Now showing items 1-10 of 10
-
An overview of some recent CMP projects at imec
Teugels, Lieve; Heylen, Nancy; Leunissen, Peter (2011) -
Carbon nanotube interconnects: electrical characterization of CNT contacts with Cu damascene top contact
van der Veen, Marleen; Vereecke, Bart; Huyghebaert, Cedric; Cott, Daire; Masahito, Sugiura; Yusaku, Kashiwagi; Teugels, Lieve; Caluwaerts, Rudy; Beyer, Gerald; Heyns, Marc; Tokei, Zsolt; De Gendt, Stefan (2011) -
Chemical mechanical polishing of nickel for damascene applications
Teugels, Lieve; Van den Eynde, Matthias; Delande, Tinne; Leunissen, Peter (2012) -
CMP of novel materials for frontend-of-line and backend-of-line applications
Leunissen, Peter; Ong, Patrick; Teugels, Lieve (2011) -
CMP process: optimization, analysis and challenges
Teugels, Lieve (2018) -
Improvement in post-Chemical Mechanical Planarization cleaning process for Ru interconnects
Harada, Ken; Shibata, Toshiaki; Kawase, Yasuhiro; Teugels, Lieve; Heylen, Nancy; Struyf, Herbert (2019) -
Investigation of chemical mechanical planarization (CMP) and post-CMP cleanig for Molybdenum
Harada, Ken; Philipsen, Harold; Teugels, Lieve; Struyf, Herbert (2019) -
New CMP challenges at imec
Teugels, Lieve; Korner, Manuela; Heylen, Nancy; Pham, Nga; Leunissen, Peter (2012) -
Tackling corrosion issues that occur during the chemical mechanical polishing process
Teugels, Lieve; Kellens, Kristof; Heylen, Nancy (2012) -
Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry system
Teugels, Lieve; Devriendt, Katia; Heylen, Nancy; Tsvetanova, Diana; Struyf, Herbert; Bast, Gerhard; Ramkhalawon, Roshita; Mueller, Dieter; Simpson, Gavin; Ulea, Neli (2016)