Browsing Presentations by imec author "e850e5eeae8524fbc5827c781e91eed3c8da7861"
Now showing items 1-20 of 37
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ArF lithography with combination of moderate OAI and attenuated PSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2001) -
CD control using SiON BARL processing for sub 0.25µm lithography
Zhang, Fenghong; Op de Beeck, Maaike; Ronse, Kurt; Gangala, Hareen K; Gopalan, P.; Conley, P.; Dusa, M.; Bendik, Joe (1998) -
Challenges and outlook of 193nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Double litho, double etch (LELE) process challenges for 22nm HP and beyond
Maenhoudt, Mireille; Wiaux, Vincent; Cheng, Shaunee; Vandenberghe, Geert; Ronse, Kurt (2008) -
DUV Lithography for 0.35 µm CMOS Processing
Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1994) -
EUV lithography development progress in IMEC
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2009) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010) -
EUV lithography: status and further challenges towards a maturing technology
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2010) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
EUVL development status & the need for computational litho
Ronse, Kurt; Vandenberghe, Geert (2010) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Lithography options for sub -90nm imaging "status 157nm lithography"
Van den hove, Luc; Ronse, Kurt (2003) -
Lithography options for the 32nm half pitch node
Gronheid, Roel; Ercken, Monique; Ronse, Kurt (2007) -
Metrology method for the correlation of line edge roughness for different resists before and after etch
Winkelmeier, Stephanie; Sarstedt, Margit; Ercken, Monique; Goethals, Mieke; Ronse, Kurt (2000) -
Opportunities and challenges in immersion lithography
Maenhoudt, Mireille; Vandenberghe, Geert; Ercken, Monique; Cheng, Shaunee; Leunissen, Peter; Ronse, Kurt (2005) -
Opportunities and challenges of immersion lithography imaging
Jonckheere, Rik; Leunissen, Peter; Ronse, Kurt; Vandenberghe, Geert (2005) -
Optical proximity correction: pattern generation issues
Jonckheere, Rik; Ronse, Kurt (1995)