Publication:

Atomic Layer Etching of Nickel Using N<sub>2</sub>/H<sub>2</sub> Plasma Exposure and Hexafluoroacetylacetone

Date

2026

Journal article

https://doi.org/10.1021/acsaelm.5c02655

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Author(s)

Ali, Ali Mohamed

;

Krieger, Guillaume

;

Soulie, Jean-Philippe

;

Knoops, Harm C. M.

;

Kessels, Wilhelmus M. M.

;

De Gendt, Stefan

;

;

de Marneffe, Jean-Francois

Journal

ACS APPLIED ELECTRONIC MATERIALS

Statistics

4 since deposited on 2026-07-27

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Acq. date: 2026-08-05