Characterization of TiN films deposited by atomic layer deposition

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Authors
Besling, W.F.A.; Satta, Alessandra; Schuhmacher, Jörg; Beyer, Gerald; Maex, Karen; Kilpela, Olli; Sprey, Hessel
Conference
Proceedings of the 3rd AVS International Conference on Microelectronics and Interfaces
Title
Characterization of TiN films deposited by atomic layer deposition
Publication type
Proceedings paper
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