Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects

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Authors

Beyer, Gerald; Satta, Alessandra; Schuhmacher, Jörg; Maex, Karen; Besling, Wim; Kilpela, Olli; Sprey, Hessel; Tempel, Georg

Issue

1_4

Journal

Microelectronic Engineering

Volume

64

Title

Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects

Publication type

Journal article

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