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Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects
Publication:
Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects
Date
2002
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Beyer, Gerald
;
Satta, Alessandra
;
Schuhmacher, Jörg
;
Maex, Karen
;
Besling, Wim
;
Kilpela, Olli
;
Sprey, Hessel
;
Tempel, Georg
Journal
Microelectronic Engineering
Abstract
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1962
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1962
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations