Show simple item record

Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications

dc.contributor.authorCaymax, Matty
dc.contributor.authorBrijs, Bert
dc.contributor.authorCarter, Richard
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorHeyns, Marc
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorZhao, Chao
dc.contributor.authorMaes, Jan
dc.contributor.authorChen, Jerry
dc.contributor.authorCosnier, Vincent
dc.contributor.authorGreen, Martin
dc.contributor.authorKaushik, Vidya
dc.contributor.authorKluth, Jon
dc.contributor.authorTsai, Wilman
dc.date.accessioned2021-10-14T21:12:51Z
dc.date.available2021-10-14T21:12:51Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6087
dc.sourceIIOimport
dc.titleGrowth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
dc.typeOral presentation
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaes, Jan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.conferenceAtomic Layer Deposition Conference - ALD
dc.source.conferencedate19/08/2002
dc.source.conferencelocationKorea Seoul
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record