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Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
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Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
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Date
2002
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Caymax, Matty
;
Brijs, Bert
;
Carter, Richard
;
Claes, Martine
;
Conard, Thierry
;
De Gendt, Stefan
;
Delabie, Annelies
;
Heyns, Marc
;
Richard, Olivier
;
Vandervorst, Wilfried
;
Zhao, Chao
;
Maes, Jan
;
Chen, Jerry
;
Cosnier, Vincent
;
Green, Martin
;
Kaushik, Vidya
;
Kluth, Jon
;
Tsai, Wilman
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2048
since deposited on 2021-10-14
Acq. date: 2025-12-10
Citations
Metrics
Views
2048
since deposited on 2021-10-14
Acq. date: 2025-12-10
Citations